1. Scope

1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Six classifications of water are described, including water for line widths as low as 0.09 micron. In all cases, the recommendations are for water at the point of distribution (POD).

1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.

1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D 1193 and Guide D 5196.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.

ASTM Standards

D1129 Terminology Relating to Water

D1193 Specification for Reagent Water

D1976 Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy

D2791 Test Method for On-line Determination of Sodium in Water

D3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption Spectrophotometry

D4191 Test Method for Sodium in Water by Atomic Absorption Spectrophotometry

D4192 Test Method for Potassium in Water by Atomic Absorption Spectrophotometry

D4327 Test Method for Anions in Water by Suppressed Ion Chromatography

D4453 Practice for Handling of High Purity Water Samples

D4517 Test Method for Low-Level Total Silica in High-Purity Water by Flameless Atomic Absorption Spectroscopy

D5173 Test Method for On-Line Monitoring of Carbon Compounds in Water by Chemical Oxidation, by UV Light Oxidation, by Both, or by High Temperature Combustion Followed by Gas Phase NDIR or by Electrolytic Conductivity

D5196 Guide for Bio-Applications Grade Water

D5391 Test Method for Electrical Conductivity and Resistivity of a Flowing High Purity Water Sample

D5462 Test Method for On-Line Measurement of Low-Level Dissolved Oxygen in Water

D5542 Test Methods for Trace Anions in High Purity Water by Ion Chromatography

D5544 Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water

D5673 Test Method for Elements in Water by Inductively Coupled Plasma--Mass Spectrometry

D5996 Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography

D5997 Test Method for On-Line Monitoring of Total Carbon, Inorganic Carbon in Water by Ultraviolet, Persulfate Oxidation, and Membrane Conductivity Detection

F1094 Test Methods for Microbiological Monitoring of Water Used for Processing Electron and Microelectronic Devices by Direct Pressure Tap Sampling Valve and by the Presterilized Plastic Bag Method

Keywords

electronic; microelectronics; semiconductor; ultra-pure water;

ICS Code

ICS Number Code 13.060.25 (Water for industrial use); 71.100.99 (Other products of the chemical industry)

DOI: 10.1520/D5127-07

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