ASTM E1438-91(2001)
Historical Standard: ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
SUPERSEDED (see Active link, below)
ASTM E1438
1. Scope
1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens. This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens.
1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution.
1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
ASTM Standards
E673 Terminology Relating to Surface Analysis
Keywords
data analysis-spectrochemical; depth resolution; interface width; profile distortion; secondary ion mass spectrometry (SIMS)
ICS Code
ICS Number Code 29.045 (Semiconducting materials)
DOI: 10.1520/E1438-91R01
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