ASTM E2246-05
Historical Standard: ASTM E2246-05 Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
SUPERSEDED (see Active link, below)
ASTM E2246
1. Scope
1.1 This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer. Measurements from cantilevers that are touching the underlying layer are not accepted.
1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.
This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
ASTM Standards
E2244 Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
E2245 Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
E2444 Terminology Relating to Measurements Taken on Thin, Reflecting Films
E2530 Practice for Calibrating the Z-Magnification of an Atomic Force Microscope at Subnanometer Displacement Levels Using Si(111) Monatomic Steps
SEMI Standard
MS2 Test Method for Step Height Measurements of Thin FilmsKeywords
cantilevers; combined standard uncertainty; fixed-fixed beams; interferometry; length measurements; microelectromechanical systems; MEMS; polysilicon; residual strain; round robin; stiction; strain gradient; test structure;
ICS Code
ICS Number Code 37.040.20 (Photographic paper, film and plates. Cartridges)
DOI: 10.1520/E2246-05
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