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  • BSI
    BS ISO 14701:2018 Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
    Edition: 2018
    $435.35
    / user per year

Description of BS ISO 14701:2018 2018

This document specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X-ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that can be restricted to less than a 6° cone semi-angle. For thermal oxides in the range 1 nm to 8 nm thickness, using the best method described in this document, uncertainties, at a 95 % confidence level, could typically be around 2 % and around 1 % at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties.



Standard NumberBS ISO 14701:2018
TitleSurface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
StatusUnder Review
Publication Date2018-11-05
ReplacesBS ISO 14701:2011
Identical National Standard OfISO 14701:2018
DescriptorsSpectroscopy, Thickness measurement, Photoelectron spectroscopy, X-ray photoelectron spectroscopy, Surface chemistry, Silicon, Chemical analysis and testing, Surface properties, Oxides, Electron emission
ICS71.040.40 Chemical analysis
CommitteeCII/60
ISBN978 0 580 51949 9
PublisherBSI
Pages26

The following editions for this book are also available...

About BSI

BSI Group, also known as the British Standards Institution is the national standards body of the United Kingdom. BSI produces technical standards on a wide range of products and services and also supplies certification and standards-related services to businesses.
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