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  • BSI
    BS ISO 22415:2019 Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
    Edition: 2019
    $442.60
    / user per year

Description of BS ISO 22415:2019 2019

This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.



Standard NumberBS ISO 22415:2019
TitleSurface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials
StatusUnder Review
Publication Date2019-05-14
Identical National Standard OfISO 22415
DescriptorsSurfaces, Chemical analysis and testing, Definitions, Vocabulary, Surface properties, Spectroscopy
ICS71.040.40 Chemical analysis
CommitteeCII/60
ISBN978 0 580 98908 7
PublisherBSI
Pages38

About BSI

BSI Group, also known as the British Standards Institution is the national standards body of the United Kingdom. BSI produces technical standards on a wide range of products and services and also supplies certification and standards-related services to businesses.
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