ASTM F2113-01e1
Historical Standard: ASTM F2113-01e1 Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
SUPERSEDED (see Active link, below)
ASTM F2113
1. Scope
1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.
1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
ASTM Standards
F1593 Test Method for Trace Metallic Impurities in Electronic Grade Aluminum by High Mass-Resolution Glow-Discharge Mass Spectrometer
Keywords
electronics; purity analysis; purity grade; sputtering; target; thin film; Electronic thin-film applications; High-purity metallic sputtering targets; Impurities--electronic materials/applications; Semiconductor device testing; Sputtering process/targets; Target specifications; Thin film applications;
ICS Code
ICS Number Code 29.045 (Semiconducting materials)
DOI: 10.1520/F2113-01E01
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